Surfmera Proxima

Surfmera PROXIMA is an industrial nanoscale analysis workhorse that creates a powerful synergy between lab-grade precision and smart production-line automation.
It seamlessly merges unmatched stability for large samples with automation intelligence, transforming complex nanoscale research into fast, reproducible, and production-ready workflows.

KEY FEATURES

  • Versatile Nanoscale Analysis: 50+ integrated techniques for comprehensive characterization;
  • Nanometer-Scale Precision: lab-grade accuracy in industrial environments;
  • Smart Automation: AI-enhanced workflows for faster R&D cycles.

APPLICATIONS AND MODES

Precision Wafer Roughness Inspection

  • Comprehensive 200×200 mm wafer scanning;
  • Automated analysis compliant with SEMI/ISO standards;
  • 3D roughness maps and process-capability reports.

Comprehensive Morphological Analysis of Micro- and Nanostructures

  • Sub-nanometer resolution 3D characterization;
  • Precise measurement of feature height, lateral dimensions, and surface roughness;
  • Automated scanning and intelligent analysis for rapid assessment.

Photoresist Performance Analysis for Lithography Optimization

  • Nanoscale characterization of photoresist behavior;
  • Rapid determination of optimal exposure parameters for lithography optimization;
  • Precise measurement of exposure dose effects on 3D morphology.
Surfmera Proxima

TECHNICAL CHARACTERISTICS

 Scanner
XYZstandard100x100x10µ
high resolution mode2x2x0,2µ
Noise levelXY300 pm in XY
Z closed loop30 pm
XY open loop30 pm
Noise of the control electronics5 μV /√Hz
Probe-to-sample positioning
MovementXY200×200 mm (300×300 mm optional)
 Z30 mm
Positioning speed along XY8 mm/s
XYZ thermal drift0.2 nm/min
Positioning repeatabilityXYless than 1 μm
ZLess than 0,2 μm
Light source850 nm SLD with FC single mode fiber
Cantilever bend registration system noise25* fm/√Hz above 50 kHz
Dimensions
W×L×H810×610×1450 mm
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